Advantech 522 Cleanroom Chemical Resistant Glove

The Advantech 522 Chemical Glove is manufactured using a tri-polymer-exclusive mix of natural latex, neoprene, and nitrile, offering 100% comfort for optimal mechanical and chemical resistance. Advantech 522 incorporates an embossed texture for extra grip and a wide cuff for double gloving. It is powder-free, non-pigmented, and suitable for ISO Class 5+ cleanrooms.

Features

• Excellent resistance and strong chemical protection against a great number of chemical products.

• Tri-polymer formula made from a mix of natural latex, neoprene, and nitrile

• The manufactured process guarantees a very low level of contaminants, particles, non-volatile residue and extractables

• Compatible with ISO Class 5+ Cleanrooms and critical environments.

• Wide cuff for double-gloving

• 61cm extended cuff

Applications

The Advantech 522 Glove has been tested on an extensive range of chemicals used in semiconductor manufacturing operations (wafer fabs). These include photoresist strippers, hydrofluoric acid (HF), pad etch solutions, silicon etchants, nitric acid, aqua regia, piranha etch, sulphuric acid, and more. For full details, see the product datasheet.

• HF etching and oxide etching at wet bench stations

• Immersion cleaning processes — SC-1, SC-2 and related chemistries

• Bulk chemical decanting and transfer

• Aluminium and silicon etch processes

• Photoresist strip using Baker PRS chemistry (PRS-2000 and PRS-3000)

• KOH and TMAH-based anisotropic etching

• Research and laboratory environments handling concentrated acids and alkalis

Size & Packaging

• Sizes: M (8), L (9), XL (10)

• Individually packed — 1 pair per bag

• Available in boxes of 6 pairs or cartons of 48 pairs

Unit of Sale

• Pairs